Aldrich® Negative Photoresist Kit I
ALDRICH/654892
Product Type: Chemical
Quality Level | 100 |
storage temp. | 2-8°C |
Application: | Aldrich® Negative Photoresist Kit I has been used in the fabrication of microelectrodes by photolithography. It can also be used to fabricate the droplet-based microfluidic device, microfluidic chips, glass optical waveguides, and integrated grating couplers. |
General description: | Aldrich® Negative Photoresist Kit I consists of materials for photolithography. The photoresist can be spin coated on the glass substrate for the formation of electrode arrays. The kit also provides masking and patterning on the glass surface. |
Legal Information: | Aldrich is a registered trademark of Sigma-Aldrich Co. LLC |
Symbol | GHS05,GHS07,GHS08,GHS09 |
Signal word | Danger |
Hazard statements | H302 + H312 + H332 - H304 - H314 - H335 - H351 - H360FD - H373 - H411 |
Precautionary statements | P273 - P280 - P301 + P330 + P331 - P303 + P361 + P353 - P304 + P340 + P310 - P305 + P351 + P338 |
Hazard Codes | T,N |
Risk Statements | 60-61-20/21/22-35-40-51/53-65 |
Safety Statements | 53-26-36/37/39-45-61-62 |
RIDADR | UN 3316 9 |
Flash Point(F) | Not applicable |
Flash Point(C) | Not applicable |
Storage Temp. | 2-8°C |
UNSPSC | 12352300 |
Components | Negative resist remover I 250 mL; Negative resist developer I 250 mL; Negative photoresist I 100 mL; Negative resist thinner I 100 mL |