Tetrakis(dimethylamido)hafnium(IV)

ALDRICH/455199 - ≥99.99%

Synonym: TDMAH; Tetrakis(dimethylamino)hafnium(IV)

CAS Number: 19782-68-4
Empirical Formula (Hill Notation): C₈H₂₄HfN₄
Molecular Weight: 354.79
MDL Number: MFCD01862473
Linear Formula: [(CH₃)₂N]₄Hf
Product Type: Chemical

Catalog Number	PKG Qty.	Price	Quantity


45-455199-25G	25 g	$1220.00 1/EA		Add To Favorites

Properties
Descriptions
Safety Info.
Basic Data

assay	≥99.99%
density	1.098 g/mL at 25 °C
form	low-melting solid
InChI	1S/4C2H6N.Hf/c41-3-2;/h41-2H3;/q4*-1;+4
InChI key	ZYLGGWPMIDHSEZ-UHFFFAOYSA-N
mp	26-29 °C (lit.)
reaction suitability	core: hafnium
SMILES string	CN(C)[Hf](N(C)C)(N(C)C)N(C)C

Analysis Note:	Purity excludes ~2000 ppm Zr.
Application:	Tetrakis(dimethylamido)hafnium(IV) can be used:• As an atomic layer deposition(ALD) precursor for deposition of hafnium oxide thin films for advanced semiconductor devices. • As a precursor to fabricate polymer-derived ceramic nanocomposites. • To prepare HfO₂, CeO₂, and Ce-doped HfO₂ thin films on Ge substrates by using tris(isopropyl-cyclopentadienyl)cerium [Ce(iPrCp)₃] precursors with H₂O via ALD method. • To produce Hf₃N₄ thin films with TDMAH and ammonia at low substrate temperatures at 150−250 °C.
General description:	Tetrakis(dimethylamido)hafnium(IV) is an organometallic compound consisting of a central hafnium atom (Hf) surrounded by four dimethylamido ligands (NMe₂). It is commonly used as a CVD/ALD precursor to produce high-quality Hf thin films. It is a solid with low melting point.
Packaging:	25 g in ampule

Symbol	GHS02,GHS05
Signal word	Danger
Hazard statements	H228 - H261 - H314
Precautionary statements	P210 - P231 + P232 - P280 - P305 + P351 + P338 - P310 - P422
Hazard Codes	F,C
Risk Statements	11-14-34
Safety Statements	6-26-36/37/39-43-45
RIDADR	UN 3396 4.1(4.3) / PGII
WGK Germany	WGK 3
Supplemental Hazard Statements	EUH014

Purity	≥99.99%
mp	26-29 °C (lit.)
Density	1.098 g/mL at 25 °C
UNSPSC	12352103

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