Bis(ethylcyclopentadienyl)ruthenium(II)

ALDRICH/648663

Synonym: Diethylruthenocene

CAS Number: 32992-96-4
Empirical Formula (Hill Notation): C₁₄H₁₈Ru
Molecular Weight: 287.36
MDL Number: MFCD03427334
Linear Formula: C₇H₉RuC₇H₉
Product Type: Chemical

Catalog Number	PKG Qty.	Price	Quantity


45-648663-2G	2 g	$429.00 1/EA		Add To Favorites

Properties
Descriptions
Safety Info.
Basic Data

bp	100 °C/0.01 mmHg (lit.)
composition	Ru, 33.9-36.4% gravimetric
density	1.3412 g/mL at 25 °C (lit.)
form	liquid
InChI	1S/2C7H9.Ru/c21-2-7-5-3-4-6-7;/h23-6H,2H2,1H3;
InChI key	VLTZUJBHIUUHIK-UHFFFAOYSA-N
mp	6 °C (lit.)
Quality Level	100
reaction suitability	core: ruthenium
	reagent type: catalyst
refractive index	n20/D 1.5870 (lit.)
SMILES string	[Ru].CC[C]1[CH][CH][CH][CH]1.CC[C]2[CH][CH][CH][CH]2
storage temp.	−20°C

Application:	Bis(ethylcyclopentadienyl)ruthenium can be used: • A precursor to synthesize ruthenium films via the atomic layer deposition (ALD) method. • A precursor to synthesize ruthenium thin films on substrates such as SiO2 via plasma enhanced atomic layer deposition (PEALD) method. • A metal-organic precursor in the chemical vapor deposition (CVD) process to deposit ruthenium (Ru) thin films suitable for applications like capacitor electrodes in microelectronics. • A precursor to prepare ultrathin ruthenium (Ru) films via the atomic layer deposition (ALD) and selective etching techniques.
Features and Benefits:	Bis(ethylcyclopentadienyl)ruthenium(II) exhibits: • High Volatility: Suitable for gas-phase delivery in Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD). • Thermal Stability: Stable under typical ALD/CVD processing temperatures
General description:	Bis(ethylcyclopentadienyl)ruthenium(II) is a organometallic compound widely used as a catalyst and as a precursor for thin-film deposition. It is valued for its high thermal stability, volatility, and efficiency in atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes to create high-purity ruthenium and ruthenium oxide films. This compound plays a crucial role in microelectronics, catalysis, and energy materials.
Packaging:	2 g in ampule

Symbol	GHS07
Signal word	Warning
Hazard statements	H315 - H319 - H335
Precautionary statements	P302 + P352 - P305 + P351 + P338
Hazard Codes	Xi
Risk Statements	36/37/38
Safety Statements	26
RIDADR	NONH for all modes of transport
WGK Germany	WGK 3
Flash Point(F)	> 199.9 °F - closed cup
Flash Point(C)	> 93.3 °C - closed cup

bp	100 °C/0.01 mmHg (lit.)
mp	6 °C (lit.)
Density	1.3412 g/mL at 25 °C (lit.)
Refractive Index	n20/D 1.5870 (lit.)
Storage Temp.	−20°C
UNSPSC	12352103

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