Tetrakis(dimethylamido)hafnium(IV)
ALDRICH/666610 - packaged for use in deposition systems
Synonym: TDMAH; Tetrakis(dimethylamino)
CAS Number: 19782-68-4
Empirical Formula (Hill Notation): C8H24HfN4
Molecular Weight: 354.79
MDL Number: MFCD01862473
Linear Formula: [(CH3)2N]4Hf
Product Type: Chemical
assay | ≥99.99% (trace metals analysis) |
density | 1.098 g/mL at 25 °C |
form | low-melting solid |
InChI | 1S/4C2H6N.Hf/c4*1-3-2;/h4 |
InChI key | ZYLGGWPMIDHSEZ-UHFFFAOYSA |
mp | 26-29 °C (lit.) |
reaction suitability | core: hafnium |
SMILES string | CN(C)[Hf](N(C)C)(N(C)C)N( |
Application: | Precursors Packaged for Depositions Systems |
Application: | Used as precursor for atomic layer deposition of Hafnium Oxide nanolaminates, which are used as a reploacement for Silicon oxide in semiconductor devices. |
General description: | Alkyl amides of Hafnium provide a convenient and effective atomic layer deposition precursor to smooth and and amorphous hafnium oxide thin films. |
Packaging: | 25 g in stainless steel cylinder |
Symbol | GHS02,GHS05 |
Signal word | Danger |
Hazard statements | H228 - H261 - H314 |
Precautionary statements | P210 - P231 + P232 - P280 - P305 + P351 + P338 - P370 + P378 - P402 + P404 |
Hazard Codes | F,C |
Risk Statements | 11-14-34 |
Safety Statements | 6-26-36/37/39-43-45 |
RIDADR | UN 3396 4.1(4.3) / PGII |
WGK Germany | WGK 3 |
Flash Point(F) | 109.4 °F - closed cup |
Flash Point(C) | 43 °C - closed cup |
Supplemental Hazard Statements | EUH014 |
Purity | ≥99.99% (trace metals analysis) |
mp | 26-29 °C (lit.) |
Density | 1.098 g/mL at 25 °C |
UNSPSC | 12352103 |