Ceramic Etchant A
ALDRICH/667447
Synonym: Al2O3 Etch; Aluminum Oxide Etchant; GaN Etch; Gallium Nitride Etchant; Si3N4 Etch; Silicon Nitride Etchant
MDL Number: MFCD08705343
Product Type: Chemical
Application: | Useful for fast and controllable etching of silicon nitride (Si3N4), galium nitride (GaN), or aluminum oxide (Al2O3). |
Features and Benefits: | Etch Rates @ 180 °C: Aluminum oxide 120 Å/min Silicon nitride 125 Å/min Gallium nitride 80 Å/min Silicon dioxide 1 Å/min Silicon 1 Å/min |
Packaging: | 500 mL in glass bottle |
Symbol | GHS05,GHS07 |
Signal word | Danger |
Hazard statements | H290 - H302 - H314 |
Precautionary statements | P234 - P270 - P280 - P301 + P312 - P303 + P361 + P353 - P305 + P351 + P338 |
Hazard Codes | C |
Risk Statements | 34 |
Safety Statements | 26-45 |
RIDADR | UN 1805 8 / PGIII |
WGK Germany | WGK 1 |
Flash Point(F) | Not applicable |
Flash Point(C) | Not applicable |
UNSPSC | 12352300 |