Copper etchant
ALDRICH/667528
Synonym: Copper etching solution
MDL Number: MFCD00161912
Product Type: Chemical
Quality Level | 100 |
vapor density | 1.3 (vs air) |
Application: | CE-200 solution can be used to etch out the copper residue or foil from the chemical vapor deposited (CVD) graphene or carbonated films by immersing the substrate with the nanomaterial into the etchant solution for 30 min. |
Application: | It is ideal for spray etching of copper. Ferric chloride based Cu etchant with etch rate of 0.5 mil/min @ 40 °C. |
Packaging: | 500 mL in glass bottle |
Symbol | GHS05 |
Signal word | Danger |
Hazard statements | H290 - H315 - H318 |
Precautionary statements | P234 - P264 - P280 - P302 + P352 - P305 + P351 + P338 - P332 + P313 |
Hazard Codes | Xn |
Risk Statements | 22-38-41 |
Safety Statements | 26-39 |
RIDADR | UN 2582 8 / PGIII |
WGK Germany | WGK 1 |
Flash Point(F) | Not applicable |
Flash Point(C) | Not applicable |
UNSPSC | 12352300 |