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Bis(methyl-η5−cyclopentadienyl)methoxymethylzirconium

ALDRICH/725471 - packaged for use in deposition systems

Synonym: ZRCMMM; ZrD-CO4

Empirical Formula (Hill Notation): C14H20ZrO
Molecular Weight: 295.53
MDL Number: MFCD16875687
Linear Formula: Zr(CH3C5H4)2CH3OCH3
Product Type: Chemical

Catalog Number PKG Qty. Price Quantity
45-725471-10G 10 g
$1240.00
1/EA
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Figure 2. Steel cylinder for use in Atomic Layer Deposition (ALD) systems.
725471: ZrD-CO4

 

bp 110 °C/0.5 mmHg (lit.)
color colorless
density 1.27 g/mL±0.01 g/mL at 25 °C (lit.)
form liquid
InChI 1S/2C6H7.CH3O.CH3.Zr/c2*1-6-4-2-3-5-6;1-2;;/h2*2-5H,1H3;1H3;1H3;/q;;-1;;+1
InChI key LFGIFPGCOXPKMG-UHFFFAOYSA-N
reaction suitability core: zirconium
SMILES string C[C]1[C][C][C][C]1.C[C]2[C][C][C][C]2.C[Zr]OC
Application: Precursors Packaged for Depositions Systems 
Application: Advanced precursor for atomic layer deposition of ZrO2 thin films. Hafnium and zirconium oxides are leading candidates to replace silicion dioxide as the gate oxide in a variety of semiconductor and energy applications. Excellent properties of HfO2 and ZrO2 films make them especially attractive for gate oxide replacement and as potential insulating dielectrics for capacitive elements in memory devices such as DRAM.
Features and Benefits: Compatible with a variety of oxidants in ALD growth processes across a wide temperature range exhibiting self limiting growth up to 400 °C. Precursor volatility and thermal stability properties enable easy materials transport from bubblers into conventional deposition tools.
General description: Atomic number of base material: 40 Zirconium
Packaging: 10 g in stainless steel cylinder
Packaging: Packaged in stainless steel cylinders compatible with conventional deposition systems. Precursors may be used in liquid injection systems as dilute solutions and in combination with a variety of other sources to deposit mixed oxides.
bp 110 °C/0.5 mmHg (lit.)
Density 1.27 g/mL±0.01 g/mL at 25 °C (lit.)
UNSPSC 12352103

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