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Tris(diethylamido)(tert-butylimido)niobium(V)

ALDRICH/751774 - packaged for use in deposition systems

Synonym: (tert)-Butyliminotris(diethylamino)niobium; tris(N-ethylethanaminato)[2-methyl-2-propanaminato(2-)]-niobium; t-Butylimido tris(diethylamido)niobium(V)

CAS Number: 210363-27-2
Empirical Formula (Hill Notation): C16H39N4Nb
Molecular Weight: 380.41
MDL Number: MFCD16659983
Linear Formula: ((CH3)6N)3NbN(CH3)3
Product Type: Chemical
Catalog Number PKG Qty. Price Quantity
45-751774-10G 10 g
 $1230.00
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density 1.015 g/mL at 25 °C
form liquid
InChI 1S/C4H9N.3C4H10N.Nb/c1-4(2,3)5;3*1-3-5-4-2;/h1-3H3;3*3-4H2,1-2H3;/q;3*-1;+3
InChI key CBCDPJRPMPTFKA-UHFFFAOYSA-N
Quality Level 100 
reaction suitability core: niobium
SMILES string CCN(CC)[Nb](=NC(C)(C)C)(N(CC)CC)N(CC)CC
Application: Tris(diethylamido)(tert-butylimido)niobium(V) is used as a niobium precursor • In atomic layer deposition to create niobium-doped tin oxide (NTO), a conductive material. These NTO scaffolds provide a large surface area for thin platinum layers, improving electron transfer in dye-sensitized solar cells.
• In metal-organic chemical vapor deposition (MOCVD) to grow niobium nitride (NbN) thin films. These films, deposited on silicon wafers, offers good conductivity and are suitable for electronic applications such as gate stacks.
General description: Tris(diethylamido)(tert-butylimido)niobium(V) (TBTDEN) is a volatile, thermally stable liquid used as a niobium precursor for thin-film deposition. It offers high vapor pressure and clean decomposition, making it ideal for applications requiring materials with high dielectric constants and robust barrier layers.
Packaging: 10 g in stainless steel cylinder
Density 1.015 g/mL at 25 °C
UNSPSC 12352103

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