Phosphorus implant in silicon depth profile standard
SIAL/NIST2133 - NIST® SRM® 2133
Product Type: Chemical
application(s) | pharmaceutical (small molecule) |
format | matrix material |
grade | certified reference material |
manufacturer/tradename | NIST® |
packaging | pkg of each |
Quality Level | 100 ![]() |
General description: | This Standard Reference Material (SRM) is intended for use in calibrating secondary ion response to minor and trace levels of phosphorus in a silicon matrix by the analytical technique of secondary ion mass spectrometry (SIMS). SRM 2133 is intended for calibrating the response of a SIMS instrument for phosphorus in a silicon matrix under a specific set of instrumental conditions. It may also be used by a laboratory as a transfer standard for the calibration of working standards of phosphorus in silicon. This SRM consists of a 1 cm × 1 cm single crystal silicon substrate that has been ion-implanted with the isotope 31P at a nominal energy of 100 keV. For more information, please refer to the COA and SDS. SRM 2133_cert ![]() ![]() ![]() ![]() |
Legal Information: | NIST is a registered trademark of National Institute of Standards and Technology |
Legal Information: | SRM is a registered trademark of National Institute of Standards and Technology |
RIDADR | NONH for all modes of transport |
WGK Germany | WGK 3 |
Flash Point(F) | Not applicable |
Flash Point(C) | Not applicable |
UNSPSC | 12352200 |