Phosphorus implant in silicon depth profile standard
SIAL/NIST2133 - NIST® SRM® 2133
Product Type: Chemical
| application(s) | semiconductor |
| format | matrix material |
| grade | certified reference material |
| manufacturer/tradename | NIST® |
| packaging | pkg of each |
| Quality Level | 100  |
| General description: | This Standard Reference Material (SRM) is intended for use in calibrating secondary ion response to minor and trace levels of phosphorus in a silicon matrix by the analytical technique of secondary ion mass spectrometry (SIMS). SRM 2133 is intended for calibrating the response of a SIMS instrument for phosphorus in a silicon matrix under a specific set of instrumental conditions. It may also be used by a laboratory as a transfer standard for the calibration of working standards of phosphorus in silicon. This SRM consists of a 1 cm × 1 cm single crystal silicon substrate that has been ion-implanted with the isotope 31P at a nominal energy of 100 keV. For more information, please refer to the COA and SDS. SRM 2133_cert  SRM 2133_SDS |
| Legal Information: | NIST is a registered trademark of National Institute of Standards and Technology |
| Legal Information: | SRM is a registered trademark of National Institute of Standards and Technology |
| Other Notes: | Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values. Phosphorus (31P) |
| RIDADR | NONH for all modes of transport |
| WGK Germany | WGK 3 |
| Flash Point(F) | Not applicable |
| Flash Point(C) | Not applicable |
| UNSPSC | 12352200 |